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SUPRIJADI

Institut Teknologi Bandung S2 - Sains Komputasi SINTA ID : 6033957
2.953
SINTA Score Overall
593
SINTA Score 3Yr
2.953
Affil Score
593
Affil Score 3Yr
METODE PEMBUATAN NANOPATTERN PADA PERMUKAAN SUBSTRAT POLYDIMETHYLSILOXANE MENGGUNAKAN CETAKAN SILIKON HASIL FABRIKASI DENGAN FOCUSED ION BEAM
Inventor : Anggraini Barlian,Candrani Khoirinaya,Damar Rastri Adhika,Suprijadi Haryono Institut Teknologi Bandung
2020 Nomor Permohonan : P00202010529 Paten
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Summary

Article Quartile
Research Output
  Scopus GScholar WOS
Article 115 64 42
Citation 643 454 208
Cited Document 79 36 27
H-Index 12 10 7
i10-Index 21 10 4
G-Index 1 2 1
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